|1||Ereztech||Tantalum (V) ethoxide (99.99+%-Ta)|
|2||Strem Chemicals, Inc.||Tantalum(V) ethoxide (99.9999%-Ta)|
|3||Strem Chemicals, Inc.||Tantalum(V) ethoxide (99.99+%-Ta)|
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Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition|
|2||Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application|
|3||Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study|
|4||Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control|
|5||In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications|
|6||Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates|
|7||Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes|
|8||Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition|
|9||Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage|
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