Ta(OC2H5)5, Ta(OEt)5, Tantalum(V) ethoxide, CAS# 6074-84-6

Where to buy

NumberVendorRegionLink
1EpiValenceπŸ‡¬πŸ‡§Tantalum ethoxide
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTantalum(V) ethoxide (99.9999%-Ta)
3Pegasus ChemicalsπŸ‡¬πŸ‡§Tantalum ethoxide
4GelestπŸ‡ΊπŸ‡ΈTantalum(V) Ethoxide
5EreztechπŸ‡ΊπŸ‡ΈTantalum(V) ethoxide
6DOCK/CHEMICALSπŸ‡©πŸ‡ͺTantalum(V)-ethoxide
7Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTantalum(V) ethoxide (99.99+%-Ta)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Nanochemistry, nanostructure, and electrical properties of Ta2O5 film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition
2Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
3Comparative study on chemical stability of dielectric oxide films under HF wet and vapor etching for radiofrequency microelectromechanical system application
4Increment of the Dielectric Constant of Ta2O5 Thin Films by Retarding Interface Oxide Growth on Si Substrates
5Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
6Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
7Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
8Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control
9In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications