Picosun SUNALE R-150B Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun SUNALE R-150B hardware returned 13 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
2Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
3Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
4Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
5Tribological properties of thin films made by atomic layer deposition sliding against silicon
6Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
7Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
8Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
9Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
10A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
11Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
12MANOS performance dependence on ALD Al2O3 oxidation source
13A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors