Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Picosun SUNALE R-150B Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun SUNALE R-150B hardware returned 14 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
2A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
3Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
4Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
5Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
6Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
7Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries
8A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
9Tribological properties of thin films made by atomic layer deposition sliding against silicon
10MANOS performance dependence on ALD Al2O3 oxidation source
11Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
12Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
13Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
14Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition