Picosun SUNALE R-150B Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Picosun SUNALE R-150B hardware returned 14 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
2Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
3Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity
4A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
5MANOS performance dependence on ALD Al2O3 oxidation source
6Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
7Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
8Tribological properties of thin films made by atomic layer deposition sliding against silicon
9Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
10Tris(dimethylamido)aluminum(III): An overlooked atomic layer deposition precursor
11Investigation of the impact of insulator material on the performance of dissimilar electrode metal-insulator-metal diodes
12Synthesis and Characterization of Tin Oxide By Atomic Layer Deposition for Solid-State Batteries
13A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
14Atomic layer deposition of tin oxide using tetraethyltin to produce high-capacity Li-ion batteries