Publication Information

Title: Tribological properties of thin films made by atomic layer deposition sliding against silicon

Type: Journal

Info: J. Vac. Sci. Technol. A 36(1), Jan/Feb 2018

Date: 2017-11-28

DOI: http://dx.doi.org/10.1116/1.5003729

Author Information

Name

Institution

VTT Technical Research Centre

VTT Technical Research Centre

VTT Technical Research Centre

Aalto University

Aalto University

Aalto University

Aalto University

University of Jyväskylä

Beneq Oy

ASM Microchemistry Oy

University of Jyväskylä

Aalto University

Aalto University

Aalto University

VTT Technical Research Centre

Films

Plasma TiN using Beneq TFS-200

Deposition Temperature = 300C

7550-45-0

7664-41-7

Deposition Temperature Range = 50-300C

75-24-1

7732-18-5

Deposition Temperature Range = 110-300C

7550-45-0

7732-18-5

Thermal NbN using Picosun R200

Deposition Temperature = 100C

10026-12-7

7664-41-7

Thermal TiAlCN using ASM EmerALD

Deposition Temperature = 100C

7550-45-0

75-24-1

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MRD X-ray Diffractometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Hardness

Nanoindentation

Hysitron TI-900 TriboIndenter

Young's Modulus

Nanoindentation

Hysitron TI-900 TriboIndenter

Friction Coefficient

Reciprocating Sliding Test

Anton Paar MCT

Wear Rate

Pin on Disc

Unknown

Substrates

Silicon

Keywords

Tribology

Notes

1140



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