Tribological properties of thin films made by atomic layer deposition sliding against silicon
Type:
Journal
Info:
J. Vac. Sci. Technol. A 36(1), Jan/Feb 2018
Date:
2017-11-28
Author Information
| Name | Institution |
|---|---|
| Lauri Kilpi | VTT Technical Research Centre |
| Oili M. E. Ylivaara | VTT Technical Research Centre |
| Antti Vaajoki | VTT Technical Research Centre |
| Xuwen Liu | Aalto University |
| Ville Rontu | Aalto University |
| Sakari Sintonen | Aalto University |
| Eero Haimi | Aalto University |
| Jari Malm | University of Jyväskylä |
| Markus Bosund | Beneq Oy |
| Marko Tuominen | ASM Microchemistry Oy |
| Timo Sajavaara | University of Jyväskylä |
| Harri Lipsanen | Aalto University |
| Simo-Pekka Hannula | Aalto University |
| Riikka L. Puurunen | Aalto University |
| Helena Ronkainen | VTT Technical Research Centre |
Films
Plasma TiN
Thermal Al2O3
Thermal TiO2
Thermal NbN
Thermal TiAlCN
Film/Plasma Properties
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Hardness
Analysis: Nanoindentation
Characteristic: Young's Modulus
Analysis: Nanoindentation
Characteristic: Friction Coefficient
Analysis: Reciprocating Sliding Test
Characteristic: Wear Rate
Analysis: Pin on Disc
Substrates
| Silicon |
Notes
| 1140 |