Tribological properties of thin films made by atomic layer deposition sliding against silicon

Type:
Journal
Info:
J. Vac. Sci. Technol. A 36(1), Jan/Feb 2018
Date:
2017-11-28

Author Information

Name Institution
Lauri KilpiVTT Technical Research Centre
Oili M. E. YlivaaraVTT Technical Research Centre
Antti VaajokiVTT Technical Research Centre
Xuwen LiuAalto University
Ville RontuAalto University
Sakari SintonenAalto University
Eero HaimiAalto University
Jari MalmUniversity of Jyväskylä
Markus BosundBeneq Oy
Marko TuominenASM Microchemistry Oy
Timo SajavaaraUniversity of Jyväskylä
Harri LipsanenAalto University
Simo-Pekka HannulaAalto University
Riikka L. PuurunenAalto University
Helena RonkainenVTT Technical Research Centre

Films

Plasma TiN


Thermal Al2O3


Thermal TiO2


Thermal NbN


Thermal TiAlCN


Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Hardness
Analysis: Nanoindentation

Characteristic: Young's Modulus
Analysis: Nanoindentation

Characteristic: Friction Coefficient
Analysis: Reciprocating Sliding Test

Characteristic: Wear Rate
Analysis: Pin on Disc

Substrates

Silicon

Keywords

Tribology

Notes

1140