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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Oili M. E. Ylivaara Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Oili M. E. Ylivaara returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
2Tribological properties of thin films made by atomic layer deposition sliding against silicon
3Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
4Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
5Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide