Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 40(6) 2022 062414
Date:
2022-10-24

Author Information

Name Institution
Oili M. E. YlivaaraVTT Technical Research Centre
Andreas LangnerVTT Technical Research Centre
Satu EkPicosun Oy
Jari MalmUniversity of Jyväskylä
Jaakko JulinUniversity of Jyväskylä
Mikko LaitinenUniversity of Jyväskylä
Saima AliAalto University
Sakari SintonenAalto University
Harri LipsanenAalto University
Timo SajavaaraUniversity of Jyväskylä
Riikka L. PuurunenVTT Technical Research Centre

Films

Thermal Al2O3


Thermal Al2O3


Thermal Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Refractive Index
Analysis: Reflectometry

Characteristic: Extinction Coefficient
Analysis: Reflectometry

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Stress
Analysis: Wafer Curvature

Characteristic: CTE, Coefficient of Thermal Expansion
Analysis: Double Substrate Method

Substrates

Si with native oxide
Sapphire

Notes

1705