Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 40(6) 2022 062414
Date:
2022-10-24
Author Information
| Name | Institution |
|---|---|
| Oili M. E. Ylivaara | VTT Technical Research Centre |
| Andreas Langner | VTT Technical Research Centre |
| Satu Ek | Picosun Oy |
| Jari Malm | University of Jyväskylä |
| Jaakko Julin | University of Jyväskylä |
| Mikko Laitinen | University of Jyväskylä |
| Saima Ali | Aalto University |
| Sakari Sintonen | Aalto University |
| Harri Lipsanen | Aalto University |
| Timo Sajavaara | University of Jyväskylä |
| Riikka L. Puurunen | VTT Technical Research Centre |
Films
Thermal Al2O3
Thermal Al2O3
Thermal Al2O3
Plasma Al2O3
Film/Plasma Properties
Characteristic: Refractive Index
Analysis: Reflectometry
Characteristic: Extinction Coefficient
Analysis: Reflectometry
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Stress
Analysis: Wafer Curvature
Characteristic: CTE, Coefficient of Thermal Expansion
Analysis: Double Substrate Method
Substrates
| Si with native oxide |
| Sapphire |
Notes
| 1705 |