Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 40(6) 2022 062414
Date:
2022-10-24
Author Information
Name | Institution |
---|---|
Oili M. E. Ylivaara | VTT Technical Research Centre |
Andreas Langner | VTT Technical Research Centre |
Satu Ek | Picosun Oy |
Jari Malm | University of Jyväskylä |
Jaakko Julin | University of Jyväskylä |
Mikko Laitinen | University of Jyväskylä |
Saima Ali | Aalto University |
Sakari Sintonen | Aalto University |
Harri Lipsanen | Aalto University |
Timo Sajavaara | University of Jyväskylä |
Riikka L. Puurunen | VTT Technical Research Centre |
Films
Thermal Al2O3
Thermal Al2O3
Thermal Al2O3
Plasma Al2O3
Film/Plasma Properties
Characteristic: Refractive Index
Analysis: Reflectometry
Characteristic: Extinction Coefficient
Analysis: Reflectometry
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Stress
Analysis: Wafer Curvature
Characteristic: CTE, Coefficient of Thermal Expansion
Analysis: Double Substrate Method
Substrates
Si with native oxide |
Sapphire |
Notes
1705 |