Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Jaakko Julin Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jaakko Julin returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition
2Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
3Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
4The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges