Publication Information

Title: Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Type: Journal

Info: J. Vac. Sci. Technol. A 36(5), Sep/Oct 2018

Date: 2018-07-06

DOI: http://dx.doi.org/10.1116/1.5038856

Author Information

Name

Institution

Aalto University

Aalto University

VTT Technical Research Centre

VTT Technical Research Centre

University of Jyväskylä

Aalto University

University of Jyväskylä

Aalto University

Aalto University

Aalto University

Films

Plasma AlN using Beneq TFS-500

Deposition Temperature Range = 150-300C

75-24-1

7664-41-7

Plasma AlN using Beneq TFS-500

Deposition Temperature = 200C

75-24-1

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MPD X-ray Diffractometer

Density

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MPD X-ray Diffractometer

Morphology, Roughness, Topography

XRR, X-Ray Reflectivity

PANalytical Xpert PRO MPD X-ray Diffractometer

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Rigaku Smartlab

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Unknown

Stress

Wafer Curvature

KLA-Tencor FLX 2320

Hardness

Nanoindentation

Hysitron TI-900 TriboIndenter

Elastic Modulus

Nanoindentation

Hysitron TI-900 TriboIndenter

Adhesion

Scratch Testing

Anton Paar MCT

Friction Coefficient

Reciprocating Sliding Test

Anton Paar MCT

Wear Rate

Reciprocating Sliding Test

Anton Paar MCT

Substrates

Si(100)

Keywords

Notes

1215



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