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Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
Type:
Journal
Info:
J. Vac. Sci. Technol. A 36(5), Sep/Oct 2018
Date:
2018-07-06
Author Information
| Name | Institution |
|---|---|
| Perttu Sippola | Aalto University |
| Alexander Pyymaki Perros | Aalto University |
| Oili M. E. Ylivaara | VTT Technical Research Centre |
| Helena Ronkainen | VTT Technical Research Centre |
| Jaakko Julin | University of Jyväskylä |
| Xuwen Liu | Aalto University |
| Timo Sajavaara | University of Jyväskylä |
| Jarkko Etula | Aalto University |
| Harri Lipsanen | Aalto University |
| Riikka L. Puurunen | Aalto University |
Films
Plasma AlN
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Stress
Analysis: Wafer Curvature
Characteristic: Hardness
Analysis: Nanoindentation
Characteristic: Elastic Modulus
Analysis: Nanoindentation
Characteristic: Adhesion
Analysis: Scratch Testing
Characteristic: Friction Coefficient
Analysis: Reciprocating Sliding Test
Characteristic: Wear Rate
Analysis: Reciprocating Sliding Test
Substrates
| Si(100) |
Notes
| 1215 |