Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 16 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
2Protective capping and surface passivation of III-V nanowires by atomic layer deposition
3Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
4Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
5Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
6Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
7Silicon surface passivation with atomic layer deposited aluminum nitride
8High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
9Properties of AlN grown by plasma enhanced atomic layer deposition
10GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
11Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
12Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
13Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
14Breakdown and Protection of ALD Moisture Barrier Thin Films
15Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
16Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas