Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 16 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
2Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
3Breakdown and Protection of ALD Moisture Barrier Thin Films
4Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
5Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
6GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
7High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
8Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
9Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
10Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
11Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
12Properties of AlN grown by plasma enhanced atomic layer deposition
13Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
14Protective capping and surface passivation of III-V nanowires by atomic layer deposition
15Silicon surface passivation with atomic layer deposited aluminum nitride
16Surface passivation of GaAs nanowires by the atomic layer deposition of AlN