Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 13 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
2Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
3Breakdown and Protection of ALD Moisture Barrier Thin Films
4Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
5GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
6High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
7Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
8Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
9Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
10Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
11Properties of AlN grown by plasma enhanced atomic layer deposition
12Silicon surface passivation with atomic layer deposited aluminum nitride
13Surface passivation of GaAs nanowires by the atomic layer deposition of AlN


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