Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 16 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
2Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
3Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
4Silicon surface passivation with atomic layer deposited aluminum nitride
5GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
6Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
7Breakdown and Protection of ALD Moisture Barrier Thin Films
8Properties of AlN grown by plasma enhanced atomic layer deposition
9Protective capping and surface passivation of III-V nanowires by atomic layer deposition
10Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
11High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
12Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
13Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
14Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
15Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
16Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers