Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 16 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
2Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
3Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
4Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
5Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
6Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
7GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
8Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
9Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
10Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
11Breakdown and Protection of ALD Moisture Barrier Thin Films
12Silicon surface passivation with atomic layer deposited aluminum nitride
13Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
14Properties of AlN grown by plasma enhanced atomic layer deposition
15Protective capping and surface passivation of III-V nanowires by atomic layer deposition
16Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers