Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 16 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
2Breakdown and Protection of ALD Moisture Barrier Thin Films
3Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
4Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
5Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
6Protective capping and surface passivation of III-V nanowires by atomic layer deposition
7Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
8Silicon surface passivation with atomic layer deposited aluminum nitride
9Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
10Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
11Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
12Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
13Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
14GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
15Properties of AlN grown by plasma enhanced atomic layer deposition
16Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition