Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 16 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

1Silicon surface passivation with atomic layer deposited aluminum nitride
2Breakdown and Protection of ALD Moisture Barrier Thin Films
3Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
4Protective capping and surface passivation of III-V nanowires by atomic layer deposition
5Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
6Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
7Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
8Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
9Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
10High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
11Properties of AlN grown by plasma enhanced atomic layer deposition
12Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
13Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
14GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
15Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
16Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature