Publication Information

Title: Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature

Type: Journal

Info: Plasma Process. Polym. 2009, 6, S237-S241

Date: 2009-11-20

DOI: http://dx.doi.org/10.1002/ppap.200930605

Author Information

Name

Institution

Lappeenranta University of Technology

Lappeenranta University of Technology

Films

Plasma Al2O3 using Beneq TFS-500

Deposition Temperature = 30C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000FI

Refractive Index

Ellipsometry

J.A. Woollam M-2000FI

Film Structure

ATR-FTIR

Nicolet 4700 FT-IR

Unknown

Internal Reflection

Unknown

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Substrates

Si with native oxide

Keywords

Notes

157



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