The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
Type:
Journal
Info:
Plasma Process. Polym. 2009, 6, S237-S241
Date:
2009-11-20
Author Information
| Name | Institution |
|---|---|
| Tommi O. Kääriäinen | Lappeenranta University of Technology |
| David C. Cameron | Lappeenranta University of Technology |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Film Structure
Analysis: ATR-FTIR
Characteristic: Unknown
Analysis: Internal Reflection
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| Si with native oxide |
Notes
| 157 |