Publication Information

Title:
Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
Type:
Journal
Info:
Plasma Process. Polym. 2009, 6, S237-S241
Date:
2009-11-20

Author Information

Name Institution
Tommi O. KääriäinenLappeenranta University of Technology
David C. CameronLappeenranta University of Technology

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Film Structure
Analysis: ATR-FTIR

Characteristic: Unknown
Analysis: Internal Reflection

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Substrates

Si with native oxide

Keywords

Notes

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