Publication Information

Title:
Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 022419 (2020)
Date:
2020-02-04

Author Information

Name Institution
David Dustin FischerTechnische Universität Dresden
Martin KnautTechnische Universität Dresden
Johanna ReifTechnische Universität Dresden
Frederik NehmTechnische Universität Dresden
Matthias AlbertTechnische Universität Dresden
Johann W. BarthaTechnische Universität Dresden

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test

Substrates

Si with native oxide
Pt
PEN, Polyethylene Napthalate

Keywords

Blistering

Notes

1459