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Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 022419 (2020)
Date:
2020-02-04
Author Information
| Name | Institution |
|---|---|
| David Dustin Fischer | Technische Universität Dresden |
| Martin Knaut | Technische Universität Dresden |
| Johanna Reif | Technische Universität Dresden |
| Frederik Nehm | Technische Universität Dresden |
| Matthias Albert | Technische Universität Dresden |
| Johann W. Bartha | Technische Universität Dresden |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Substrates
| Si with native oxide |
| Pt |
| PEN, Polyethylene Napthalate |
Notes
| 1459 |