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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
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Martin Knaut Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Martin Knaut returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
2High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
3In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
4Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers