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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Matthias Albert Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Matthias Albert returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
2In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
3Breakdown and Protection of ALD Moisture Barrier Thin Films
4In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
5Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
6Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
7High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating