Matthias Albert Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Matthias Albert returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
2In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
3In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
4Breakdown and Protection of ALD Moisture Barrier Thin Films
5Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements
6Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
7Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films