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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
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Johann W. Bartha Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Johann W. Bartha returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition
2Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
3Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
4In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films
5Controlling threshold voltage and leakage currents in vertical organic field-effect transistors by inversion mode operation
6High-aspect-ratio TSVs with thALD/PEALD tantalum-based barrier layer, thALD Ruthenium seed layer and subsequent copper electroplating
7Low-thermal budget flash light annealing for Al2O3 surface passivation
8Breakdown and Protection of ALD Moisture Barrier Thin Films
9Comparison of PVD, PECVD & PEALD Ru(-C) films as Cu diffusion barriers by means of bias temperature stress measurements