2021 Year in Review
The publication database currently has 1616 entries.
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202 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
250 Film and Plasma Characteristics
88 Theses
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Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
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Controlling threshold voltage and leakage currents in vertical organic field-effect transistors by inversion mode operation
Type:
Journal
Info:
Applied Physics Letters 107, 233302 (2015)
Date:
2015-11-26
Author Information
| Name | Institution |
|---|---|
| Alrun A. Günther | Technische Universität Dresden |
| Christoph Hossbach | Technische Universität Dresden |
| Michael Sawatzki | Technische Universität Dresden |
| Daniel Kasemann | CreaPhys GmbH |
| Johann W. Bartha | Technische Universität Dresden |
| Karl Leo | Technische Universität Dresden |
Films
Film/Plasma Properties
Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Substrates
| Silicon |
Keywords
Notes
| 435 |