Low-thermal budget flash light annealing for Al2O3 surface passivation

Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 11, pages 631--635, 2015
Date:
2015-10-12
DOI:
http://dx.doi.org/10.1002/pssr.201510306

Author Information

Name Institution
Daniel Kai SimonNaMLab gGmbH
Thomas HenkeTechnische Universität Dresden
Paul Matthias JordanNaMLab gGmbH
Franz P. G. FenglerNaMLab gGmbH
Thomas MikolajickNaMLab gGmbH
Johann W. BarthaTechnische Universität Dresden
Ingo DirnstorferNaMLab gGmbH

Films

Plasma Al2O3

Hardware used: Unknown
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Interface Trap Density
Analysis: C-V, Capacitance-Voltage Measurements
Diagnostic: -

Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements
Diagnostic: -

Characteristic: Lifetime
Analysis: -
Diagnostic: -

Substrates

Notes

507