About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Daniel Kai Simon Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Daniel Kai Simon returned 4 record(s).

NumberTitle
1Low-thermal budget flash light annealing for Al2O3 surface passivation
2On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes
3Trapped charge densities in Al2O3-based silicon surface passivation layers
4Symmetrical Al2O3-based passivation layers for p- and n-type silicon