Name

Institution

Daniel Kai Simon

NaMLab gGmbH

Thermal Al₂O₃ using Unknown

Deposition Temperature = 150C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Water, H₂O

7732-18-5

Thermal HfO₂ using Unknown

Deposition Temperature = 150C

TEMAH, Tetrakis[(EthylMethyl)Amido]Hafnium, [(EtMe)N]₄Hf

352535-01-4

Where to buy precursor

Water, H₂O

7732-18-5

Plasma SiO₂ using Unknown

Deposition Temperature = 150C

Diaminosilane, SiH₂(NH₂)₂

0-0-0

Oxygen, O₂

7782-44-7

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Thin Film Solar Cell

Passivation

PEALD SiO₂ and thermal ALD Al₂O₃ and HfO₂ for PV passivation application.

290