Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Diaminosilane, SiH2(NH2)2, CAS# 0-0-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Symmetrical Al2O3-based passivation layers for p- and n-type silicon
2Trapped charge densities in Al2O3-based silicon surface passivation layers
3On the Control of the Fixed Charge Densities in Al2O3 Based Silicon Surface Passivation Schemes