Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2018, 10 (7), pp 6601-6607
Date:
2018-01-30
DOI:
http://dx.doi.org/10.1021/acsami.7b16479

Author Information

Name Institution
Xinrui LvChinese Academy of Sciences
Yunzhen CaoChinese Academy of Sciences
Lu YanChinese Academy of Sciences
Ying LiChinese Academy of Sciences
Yuzhi ZhangChinese Academy of Sciences
Lixin SongChinese Academy of Sciences

Films

Plasma MoOx

Hardware used: Beneq TFS-500
Molybdenum hexacarbonyl, Mo(CO)6
CAS#: 13939-06-5
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 140-180C

Thermal VOx

Hardware used: Beneq TFS-500
TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide
CAS#: 19824-56-7
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range N/A

Other VMoO2

Hardware used: Beneq TFS-500
Molybdenum hexacarbonyl, Mo(CO)6
CAS#: 13939-06-5
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
TDMAV, (Me2N)4V, [(CH3)2N]4V, Tetrakis(DiMethylAmido) Vanadium, Vanadium Dimethylamide
CAS#: 19824-56-7
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam VASE

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Substrates

Si(100)

Notes

1206