About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 16 records.

NumberTitle
1High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
2Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
3Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
4Breakdown and Protection of ALD Moisture Barrier Thin Films
5Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
6Properties of AlN grown by plasma enhanced atomic layer deposition
7Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
8Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
9GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
10Protective capping and surface passivation of III-V nanowires by atomic layer deposition
11Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
12Silicon surface passivation with atomic layer deposited aluminum nitride
13Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
14Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
15Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
16Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces