Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 16 records.

NumberTitle
1GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
2Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
3Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
4Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
5Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
6Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
7Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
8Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
9Properties of AlN grown by plasma enhanced atomic layer deposition
10Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
11Silicon surface passivation with atomic layer deposited aluminum nitride
12Protective capping and surface passivation of III-V nanowires by atomic layer deposition
13High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
14Breakdown and Protection of ALD Moisture Barrier Thin Films
15Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
16Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition