Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Beneq TFS-500 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using Beneq TFS-500 hardware returned 16 records.

NumberTitle
1Breakdown and Protection of ALD Moisture Barrier Thin Films
2High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
3Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
4Influence of plasma chemistry on impurity incorporation in AlN prepared by plasma enhanced atomic layer deposition
5Direct plasma-enhanced atomic layer deposition of aluminum nitride for water permeation barriers
6Silicon surface passivation with atomic layer deposited aluminum nitride
7Protective capping and surface passivation of III-V nanowires by atomic layer deposition
8Properties of atomic-layer-deposited ultra-thin AlN films on GaAs surfaces
9Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas
10GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride
11Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
12Plasma-Assisted Atomic Layer Deposition of Al2O3 at Room Temperature
13Surface passivation of GaAs nanowires by the atomic layer deposition of AlN
14Properties of AlN grown by plasma enhanced atomic layer deposition
15Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
16Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation