Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
Type:
Journal
Info:
Nanoscale Research Letters (2015) 10:89
Date:
2015-02-12
Author Information
Name | Institution |
---|---|
Sannian Song | Chinese Academy of Sciences |
Dongning Yao | Chinese Academy of Sciences |
Zhitang Song | Chinese Academy of Sciences |
Lina Gao | Chinese Academy of Sciences |
Zhonghua Zhang | Chinese Academy of Sciences |
Le Li | Chinese Academy of Sciences |
Lanlan Shen | Chinese Academy of Sciences |
Liangcai Wu | Chinese Academy of Sciences |
Bo Liu | Chinese Academy of Sciences |
Yan Cheng | Chinese Academy of Sciences |
Songlin Feng | Chinese Academy of Sciences |
Films
Plasma Sb2Te3
Plasma GeSbTe
Film/Plasma Properties
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Electrical Properties
Analysis: I-V, Current-Voltage Measurements
Characteristic: Electrical Properties
Analysis: R-V, Resistance Voltage Measurements
Characteristic: Morphology, Roughness, Topography
Analysis: -
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Substrates
Si3N4 |
W |
Notes
Beneq TFS 500 PEALD of SbTe and GeSbTe for phase change memory study. |
333 |