TDMAGe, (Me2N)4Ge, [(CH3)2N]4Ge, Tetrakis(DiMethylAmido) Germanium, Germanium Dimethylamide, CAS# 7344-40-3

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1GeSbTe deposition for the PRAM application
2GeSbTe deposition for the PRAM application
3Phase-change properties of GeSbTe thin films deposited by plasma-enchanced atomic layer depositon
4Plasma-assisted atomic layer deposition of germanium antimony tellurium compounds
5Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications