Publication Information

Title:
Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
Type:
Journal
Info:
ECS Transactions, 58 (10) 223-233 (2013)
Date:
2013-10-18

Author Information

Name Institution
Julien FerrandSTMicroelectronics
Virginie BeuginSTMicroelectronics
Alexandre CrisciGrenoble-CNRS-Université Joseph Fourier
Stéphane CoindeauGrenoble-CNRS-Université Joseph Fourier
Simon JeannotSTMicroelectronics
Mickaël Gros-JeanSTMicroelectronics
Elisabeth BlanquetGrenoble-CNRS-Université Joseph Fourier

Films

Plasma ZrO2




Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: EPMA, Electron Probe Micro Analyzer

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Substrates

Si(100)
TiN

Keywords

Notes

624