TBTDET, Tert-Butylimido Tris(DiEthylamino) Tantalum, Ta[N(C₂H₅)₂]₃[=NC(CH₃)₃], CAS# 169896-41-7

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	(t-Butylimido)tris(diethylamino)tantalum(V), min. 98% (99.99%-Ta)
2	EpiValence	Tantalum tert-butylimido trisdiethylamide
3	Sigma-Aldrich, Co. LLC	Tris(diethylamido)(tert-butylimido)tantalum(V)
4	Alfa Aesar	Tantalum tris(diethylamido)-tert-butylimide, 99.99% (metals basis)
5	Santa Cruz Biotechnology	Tris(diethylamido)(tert-butylimido)tantalum(V)
6	Alfa Aesar	Tert-butylimido tris(diethylamido) tantalum

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 18 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
2	Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition
3	Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
4	Selective deposition of Ta2O5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps
5	Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
6	Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
7	Evaluation of plasma parameters on PEALD deposited TaCN
8	Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma and tert-Butylimidotris( diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
9	Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
10	Plasma-Enhanced Atomic Layer Deposition of TaCxNy Films with tert-Butylimido Tris-diethylamido Tantalum and Methane-Hydrogen Gas
11	Properties of Plasma-Enhanced Atomic Layer Deposition-Grown Tantalum Carbonitride Thin Films
12	The Integration of Plasma Enhanced Atomic Layer Deposition (PEALD) of Tantalum- Based Thin Films for Copper Diffusion Barrier Applications
13	Chemical Reaction Mechanism in the Atomic Layer Deposition of TaCxNy Films Using tert-Butylimidotris(diethylamido)tantalum
14	Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications
15	Nucleation and growth of tantalum nitride atomic layer deposition on Al2O3 using TBTDET and hydrogen radicals
16	Preparation of Ru thin film layer on Si and TaN/Si as diffusion barrier by plasma enhanced atomic layer deposition
17	The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
18	Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications

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