The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Development of Manufacturable Solutions for the Direct Plating of Copper on Robust ALD-Grown Barriers
Type:
Journal
Info:
ECS Transactions, 6 (8) 77-88 (2007)
Date:
2007-05-09
Author Information
| Name | Institution |
|---|---|
| Sumit Kumar | State University of New York at Albany |
| Daniel V. Greenslit | State University of New York at Albany |
| Eric T. Eisenbraun | State University of New York at Albany |
Films
Plasma Ru
Film/Plasma Properties
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Diffusion Barrier Properties
Analysis: Custom
Substrates
| SiO2 |
| TaN |
Notes
| 1319 |