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Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 29, 030605 (2011)
Date:
2011-04-11
Author Information
| Name | Institution |
|---|---|
| Tonmoy Chakraborty | State University of New York at Albany |
| Daniel V. Greenslit | State University of New York at Albany |
| Eric T. Eisenbraun | State University of New York at Albany |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Substrates
| SiO2 |
Notes
| 690 |