Your search for plasma enhanced atomic layer deposition publications authored by Tonmoy Chakraborty returned 4 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications|
|2||Development of plasma-enhanced atomic layer deposition grown Ru-WCN mixed phase films for nanoscale diffusion barrier and copper direct-plate applications|
|3||Microstructure analysis of plasma enhanced atomic layer deposition-grown mixed-phase RuTaN barrier for seedless copper electrodeposition|
|4||Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers|
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