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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
The Properties of Cu Thin Films on Ru Depending on the ALD Temperature
Type:
Journal
Info:
Journal of Nanoscience and Nanotechnology, Volume 15, Number 2, pp. 1601-1604
Date:
2015-02-01
Author Information
| Name | Institution |
|---|---|
| Hyeong-Chul Yoon | Sungkyunkwan University |
| Jin-Ha Shin | Sungkyunkwan University |
| Hwa-Sun Park | Sungkyunkwan University |
| Su-Jeong Suh | Sungkyunkwan University |
Films
Film/Plasma Properties
Substrates
| SiO2 |
| TaN |
Keywords
| Diffusion Barrier |
| Interconnect |
Notes
| 543 |