ASM EmerALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM EmerALD hardware returned 11 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
2Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
3Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
4Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
5Tribological properties of thin films made by atomic layer deposition sliding against silicon
6Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
7Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
8ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
9Evaluation of plasma parameters on PEALD deposited TaCN
10PEALD ZrO2 Films Deposition on TiN and Si Substrates
11Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications