ASM EmerALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM EmerALD hardware returned 12 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
2PEALD ZrO2 Films Deposition on TiN and Si Substrates
3Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
4Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
5Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
6Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
7Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
8Evaluation of plasma parameters on PEALD deposited TaCN
9Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
10Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
11ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
12Tribological properties of thin films made by atomic layer deposition sliding against silicon