Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


ASM EmerALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM EmerALD hardware returned 12 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Evaluation of plasma parameters on PEALD deposited TaCN
2Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
3Tribological properties of thin films made by atomic layer deposition sliding against silicon
4Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
5Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
6Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
7Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
8Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
9Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
10Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
11ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
12PEALD ZrO2 Films Deposition on TiN and Si Substrates