ASM EmerALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM EmerALD hardware returned 11 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
2PEALD ZrO2 Films Deposition on TiN and Si Substrates
3Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
4Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
5Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
6Tribological properties of thin films made by atomic layer deposition sliding against silicon
7ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
8Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
9Evaluation of plasma parameters on PEALD deposited TaCN
10Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
11Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications