Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


ASM EmerALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM EmerALD hardware returned 12 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Tribological properties of thin films made by atomic layer deposition sliding against silicon
2ZrO2 Thin Film Deposition on TiN by Plasma Enhanced Atomic Layer Deposition Using Cyclopentadienyltris(dimetylamino)zirconium
3Evaluation of plasma parameters on PEALD deposited TaCN
4Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
5PEALD ZrO2 Films Deposition on TiN and Si Substrates
6Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3
7Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
8Tetragonal Zirconia Stabilization by Metal Addition for Metal-Insulator-Metal Capacitor Applications
9Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
10Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
11Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
12Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration