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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 34, 051807 (2016)
Date:
2016-08-25
Author Information
| Name | Institution |
|---|---|
| E. Dupuy | Grenoble Alps University (UGA) |
| E. Pargon | Grenoble Alps University (UGA) |
| M. Fouchier | Grenoble Alps University (UGA) |
| H. Grampeix | CEA - Grenoble |
| J. Pradelles | CEA - Grenoble |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
| Photoresist |
| TOK CAP64, Positive Chemically Amplified Photoresist |
| ARC, Antireflective Coating |
Keywords
Notes
| 906 |