Publication Information

Title:
Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 34, 051807 (2016)
Date:
2016-08-25

Author Information

Name Institution
E. DupuyGrenoble Alps University (UGA)
E. PargonGrenoble Alps University (UGA)
M. FouchierGrenoble Alps University (UGA)
H. GrampeixCEA - Grenoble
J. PradellesCEA - Grenoble

Films

Plasma SiO2


Film/Plasma Properties

Substrates

Photoresist
TOK CAP64, Positive Chemically Amplified Photoresist
ARC, Antireflective Coating

Keywords

Notes

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