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Publication Information

Title: Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration

Type: Journal

Info: Journal of Vacuum Science & Technology B 34, 051807 (2016)

Date: 2016-08-25

DOI: http://dx.doi.org/10.1116/1.4962322

Author Information

Name

Institution

E. Dupuy

Grenoble Alps University (UGA)

E. Pargon

Grenoble Alps University (UGA)

M. Fouchier

Grenoble Alps University (UGA)

H. Grampeix

CEA - Grenoble

J. Pradelles

CEA - Grenoble

Films

Plasma SiO2 using ASM EmerALD

Deposition Temperature = 50C

Bis(diethylamino)silane, BDEAS, SAM-24, (Et2N)2SiH2

27804-64-4

Where to buy precursor

Oxygen, O2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Photoresist

TOK CAP64, Positive Chemically Amplified Photoresist

ARC, Antireflective Coating

Keywords

Notes

906


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