Search 1553 plasma ALD publications by:
Search 1553 plasma ALD publications by:
Publication Information
Title:
Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 34, 051807 (2016)
Date:
2016-08-25
Author Information
Name | Institution |
---|---|
E. Dupuy | Grenoble Alps University (UGA) |
E. Pargon | Grenoble Alps University (UGA) |
M. Fouchier | Grenoble Alps University (UGA) |
H. Grampeix | CEA - Grenoble |
J. Pradelles | CEA - Grenoble |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
Photoresist |
TOK CAP64, Positive Chemically Amplified Photoresist |
ARC, Antireflective Coating |
Keywords
Notes
906 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |