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Development and characterization of an atmospheric pressure plasma reactor compatible with spatial ALD
ZnO Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition: Material Properties Within and Outside the "Atomic Layer Deposition Window"
Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
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Publication Information
Title:
Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 34, 051807 (2016)
Date:
2016-08-25
Author Information
| Name | Institution |
|---|---|
| E. Dupuy | Grenoble Alps University (UGA) |
| E. Pargon | Grenoble Alps University (UGA) |
| M. Fouchier | Grenoble Alps University (UGA) |
| H. Grampeix | CEA - Grenoble |
| J. Pradelles | CEA - Grenoble |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
| Photoresist |
| TOK CAP64, Positive Chemically Amplified Photoresist |
| ARC, Antireflective Coating |
Keywords
Notes
| 906 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |