2021 Year in Review
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Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
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Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 34, 051807 (2016)
Date:
2016-08-25
Author Information
| Name | Institution |
|---|---|
| E. Dupuy | Grenoble Alps University (UGA) |
| E. Pargon | Grenoble Alps University (UGA) |
| M. Fouchier | Grenoble Alps University (UGA) |
| H. Grampeix | CEA - Grenoble |
| J. Pradelles | CEA - Grenoble |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
| Photoresist |
| TOK CAP64, Positive Chemically Amplified Photoresist |
| ARC, Antireflective Coating |
Keywords
Notes
| 906 |