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Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 34, 051807 (2016)
Date:
2016-08-25
Author Information
| Name | Institution |
|---|---|
| E. Dupuy | Grenoble Alps University (UGA) |
| E. Pargon | Grenoble Alps University (UGA) |
| M. Fouchier | Grenoble Alps University (UGA) |
| H. Grampeix | CEA - Grenoble |
| J. Pradelles | CEA - Grenoble |
Films
Plasma SiO2
Film/Plasma Properties
Substrates
| Photoresist |
| TOK CAP64, Positive Chemically Amplified Photoresist |
| ARC, Antireflective Coating |
Keywords
Notes
| 906 |