Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2, CAS# 27804-64-4

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM
2DOCK/CHEMICALS🇩🇪Bis(diethylamino)silane
3Ereztech🇺🇸Bis(diethylamino)silane
4Pegasus Chemicals🇬🇧Bis(diethylamino)silane
5Strem Chemicals, Inc.🇺🇸Bis(diethylamino)silane, 97% BDEAS
6Yoodatech (Shanghai) Co., LtdBDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2 - contact maggie@yoodatech.com

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 45 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
2Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
3Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
4Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
5Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
6Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
7Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
8Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
9Designing high performance precursors for atomic layer deposition of silicon oxide
10Comparative study of ALD SiO2 thin films for optical applications
11Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
12Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
13'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
14Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
15Energy-enhanced atomic layer deposition for more process and precursor versatility
16Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
17Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
18Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
19Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
20Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
21Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
22Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
23PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
24Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
25Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
26Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
27Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
28Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
29Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
30Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
31Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
32Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
33Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
34Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
35Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
36Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
37Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
38Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
39Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
40Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
41Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
42High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
43Breakdown and Protection of ALD Moisture Barrier Thin Films
44On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
45Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2