BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2, CAS# 27804-64-4

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1Strem Chemicals, Inc.Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM
2EpiValenceBis(Diethylamino) silane
3Strem Chemicals, Inc.Bis(diethylamino)silane, 97% BDEAS
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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 41 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

1Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
2Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
3Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
4Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
5Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
6'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
9Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
10Breakdown and Protection of ALD Moisture Barrier Thin Films
11Comparative study of ALD SiO2 thin films for optical applications
12Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
13Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
14Designing high performance precursors for atomic layer deposition of silicon oxide
15Energy-enhanced atomic layer deposition for more process and precursor versatility
16Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
17Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
18Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
19Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
20High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
21Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
22Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
23Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
24Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
25Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
26Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
27Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
28On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
29PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
30Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
31Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
32Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
33Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
34Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
35Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
36Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
37Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
38Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
39Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
40Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
41Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition