Bis(diethylamino)silane, BDEAS, SAM-24, (Et2N)2SiH2, CAS# 27804-64-4

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 40 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
2Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
3Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
4Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
5Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
6'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
7A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
8Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
9Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
10Breakdown and Protection of ALD Moisture Barrier Thin Films
11Comparative study of ALD SiO2 thin films for optical applications
12Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
13Designing high performance precursors for atomic layer deposition of silicon oxide
14Energy-enhanced atomic layer deposition for more process and precursor versatility
15Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
16Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
17Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
18Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
19High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
20Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
21Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
22Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
23Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
24Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
25Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
26Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
27On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
28PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
29Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
30Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
31Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
32Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
33Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
34Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
35Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
36Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
37Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
38Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
39Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
40Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition