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Bis(diethylamino)silane, BDEAS, SAM-24, (Et2N)2SiH2, CAS# 27804-64-4

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1Strem Chemicals, Inc.Bis(diethylamino)silane, 97% BDEAS

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 32 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
2Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
3Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
4Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
5'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
6A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
7Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
8Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
9Breakdown and Protection of ALD Moisture Barrier Thin Films
10Comparative study of ALD SiO2 thin films for optical applications
11Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
12Designing high performance precursors for atomic layer deposition of silicon oxide
13Energy-enhanced atomic layer deposition for more process and precursor versatility
14Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
15Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
16High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
17Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
18Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
19Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
20Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
21On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
22PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
23Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
24Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
25Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
26Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
27Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
28Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
29Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
30Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
31Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
32Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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