BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2, CAS# 27804-64-4

Where to buy

NumberVendorRegionLink
1Strem Chemicals, Inc.🇺🇸Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM
2Yoodatech (Shanghai) Co., LtdBDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2 - contact maggie@yoodatech.com
3DOCK/CHEMICALS🇩🇪Bis(diethylamino)silane
4Strem Chemicals, Inc.🇺🇸Bis(diethylamino)silane, 97% BDEAS
5Pegasus Chemicals🇬🇧Bis(diethylamino)silane
6Ereztech🇺🇸Bis(diethylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 45 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
2Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
3Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
4A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
5Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
6Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
7Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
8Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
9Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
10Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
11Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
12Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
13Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
14Comparative study of ALD SiO2 thin films for optical applications
15Designing high performance precursors for atomic layer deposition of silicon oxide
16Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
17Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
18Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
19Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
20Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
21'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
22Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
23On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
24Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
25Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
26Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
27Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
28Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
29Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
30Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
31Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
32Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
33Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
34Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
35Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
36Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
37Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
38Breakdown and Protection of ALD Moisture Barrier Thin Films
39Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
40PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
41Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
42High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
43Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
44Energy-enhanced atomic layer deposition for more process and precursor versatility
45Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition