BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2, CAS# 27804-64-4

Where to buy

NumberVendorRegionLink
1Ereztech🇺🇸Bis(diethylamino)silane
2DOCK/CHEMICALS🇩🇪Bis(diethylamino)silane
3Strem Chemicals, Inc.🇺🇸Bis(diethylamino)silane, 97% BDEAS
4Yoodatech (Shanghai) Co., LtdBDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2 - contact maggie@yoodatech.com
5Strem Chemicals, Inc.🇺🇸Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM
6Pegasus Chemicals🇬🇧Bis(diethylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 45 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
2Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
3Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
4Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
5Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
6Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
7Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
8Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
9Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
10Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
11Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
12Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
13Energy-enhanced atomic layer deposition for more process and precursor versatility
14Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
15Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
16Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
17Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
18Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
19Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle
20A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
21Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
22Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
23Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
24Breakdown and Protection of ALD Moisture Barrier Thin Films
25On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
26Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
27Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
28PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
29Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
30High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
31Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
32Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
33Designing high performance precursors for atomic layer deposition of silicon oxide
34Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
35Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
36'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
37Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
38Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
39Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
40Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
41Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
42Comparative study of ALD SiO2 thin films for optical applications
43Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
44Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
45Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2