BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2, CAS# 27804-64-4

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALSπŸ‡©πŸ‡ͺBis(diethylamino)silane
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM
3Pegasus ChemicalsπŸ‡¬πŸ‡§Bis(diethylamino)silane
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈBis(diethylamino)silane, 97% BDEAS
5EpiValenceπŸ‡¬πŸ‡§Bis(Diethylamino) silane
6EreztechπŸ‡ΊπŸ‡ΈBis(diethylamino)silane

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 43 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Single-electron transistors featuring silicon nitride tunnel barriers prepared by atomic layer deposition
2Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
3Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
4Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment
5Breakdown and Protection of ALD Moisture Barrier Thin Films
6Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
7Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
8Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
9Internal Photoemission Spectroscopy Measurements of the Energy Barrier Heights between ALD SiO2 and Ta-Based Amorphous Metals
10Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
11Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
12Spectral analysis of sidewall roughness during resist-core self-aligned double patterning integration
13Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach
14On the role of nanoporosity in controlling the performance of moisture permeation barrier layers
15Fabrication of nanoporous membranes for tuning microbial interactions and biochemical reactions
16Plasma Enhanced Atomic Layer Deposition of SiO2 Using Space-Divided Plasma System
17Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
18Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
19Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
20PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
21'Zero-charge' SiO2/Al2O3 stacks for the simultaneous passivation of n+ and p+ doped silicon surfaces by atomic layer deposition
22Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
23Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
24Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties
25Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
26Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
27Energy-enhanced atomic layer deposition for more process and precursor versatility
28High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal-Organic Silicon Precursor and Oxygen Radical
29Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
30Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
31Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
32Theoretical Understanding of the Reaction Mechanism of SiO2 Atomic Layer Deposition
33Designing high performance precursors for atomic layer deposition of silicon oxide
34Multiscale modeling for SiO2 atomic layer deposition for high-aspect-ratio hole patterns
35Plasma Enhanced Atomic Layer Deposition of Al2O3/SiO2 MIM Capacitors
36A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
37Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
38Controlling the fixed charge and passivation properties of Si(100)/Al2O3 interfaces using ultrathin SiO2 interlayers synthesized by atomic layer deposition
39Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
40Comparative study of ALD SiO2 thin films for optical applications
41Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3, and HfO2
42Plasma-Assisted Atomic Layer Deposition of Low Temperature SiO2
43Improved film quality of plasma enhanced atomic layer deposition SiO2 using plasma treatment cycle