Simultaneous scanning tunneling microscopy and synchrotron X-ray measurements in a gas environment

Type:
Journal
Info:
Ultramicroscopy 182 (2017) 233-242
Date:
2017-07-09
DOI:
https://doi.org/10.1016/j.ultramic.2017.07.011

Author Information

Name Institution
Rik V. MomLeiden University
Willem G. OnderwaaterLeiden University
Marcel J. RostLeiden University
Maciej JankowskiEuropean Synchrotron Radiation Facility (ESRF)
Sabine WenzelLeiden University
Leon JacobseLeiden University
Paul F.A. AlkemadeDelft University of Technology
Vincent VandalonEindhoven University of Technology
Matthijs A. van SpronsenLeiden University
Matthijs van WeerenLeiden University
Bert CramaLeiden University
Peter van der TuijnLeiden University
Roberto FeliciEuropean Synchrotron Radiation Facility (ESRF)
Erwin (W.M.M.) KesselsEindhoven University of Technology
Francesco CarlàEuropean Synchrotron Radiation Facility (ESRF)
Joost W.M. FrenkenLeiden University
Irene M.N. GrootLeiden University

Films

Plasma SiO2

Hardware used: Unknown
BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2
CAS#: 27804-64-4
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Pt
Ir

Notes

1137