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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Where to buy BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2 CAS# 27804-64-4
BDEAS, SAM-24, Bis(diethylamino)silane, (Et2N)2SiH2 CAS# 27804-64-4 is available from the following source(s):
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Strem Chemicals, Inc. | 🇺🇸 | Bis(diethylamino)silane, 99% (99.999%-Si) BDEAS PURATREM |
| 2 | Strem Chemicals, Inc. | 🇺🇸 | Bis(diethylamino)silane, 97% BDEAS |
| 3 | DOCK/CHEMICALS | 🇩🇪 | Bis(diethylamino)silane |
| 4 | Ereztech | 🇺🇸 | Bis(diethylamino)silane |
| 5 | EpiValence | 🇬🇧 | Bis(Diethylamino) silane |
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