Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition

Type:
Journal
Info:
Appl. Sci. 2017, 7, 246
Date:
2017-02-27

Author Information

Name Institution
Golnaz KarbasianUniversity of Notre Dame
Michael S. McConnellUniversity of Notre Dame
Hubert GeorgeUniversity of Notre Dame
Louisa C. SchneiderUniversity of Notre Dame
Matthew J. FilmerUniversity of Notre Dame
Alexei P. OrlovUniversity of Notre Dame
Alexei N. NazarovV.E. Lashkaryov Institute of Semiconductor Physics
Gregory L. SniderUniversity of Notre Dame

Films

Plasma SiO2




Film/Plasma Properties

Substrates

Pt
Ni

Notes

1100