Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition
Type:
Journal
Info:
Appl. Sci. 2017, 7, 246
Date:
2017-02-27
Author Information
Name | Institution |
---|---|
Golnaz Karbasian | University of Notre Dame |
Michael S. McConnell | University of Notre Dame |
Hubert George | University of Notre Dame |
Louisa C. Schneider | University of Notre Dame |
Matthew J. Filmer | University of Notre Dame |
Alexei P. Orlov | University of Notre Dame |
Alexei N. Nazarov | V.E. Lashkaryov Institute of Semiconductor Physics |
Gregory L. Snider | University of Notre Dame |
Films
Plasma SiO2
Plasma SiO2
Plasma SiNx
Film/Plasma Properties
Substrates
Pt |
Ni |
Notes
1100 |