
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
Type:
Journal
Info:
Chem. Mater. 0, 0, null
Date:
2021-04-15
Author Information
Name | Institution |
---|---|
Karsten Arts | Eindhoven University of Technology |
Harvey Thepass | Eindhoven University of Technology |
Marcel A. Verheijen | Eindhoven University of Technology |
Riikka L. Puurunen | Aalto University |
Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
Harm C. M. Knoops | Eindhoven University of Technology |
Films
Plasma TiO2
Plasma Al2O3
Plasma SiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Reflectometry
Characteristic: Wet Etch Resistance
Analysis: Custom
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Substrates
Silicon |
Keywords
Notes
1570 |