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Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
Type:
Journal
Info:
Chem. Mater. 0, 0, null
Date:
2021-04-15
Author Information
| Name | Institution |
|---|---|
| Karsten Arts | Eindhoven University of Technology |
| Harvey Thepass | Eindhoven University of Technology |
| Marcel A. Verheijen | Eindhoven University of Technology |
| Riikka L. Puurunen | Aalto University |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
Films
Plasma TiO2
Plasma Al2O3
Plasma SiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Reflectometry
Characteristic: Wet Etch Resistance
Analysis: Custom
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Substrates
| Silicon |
Notes
| 1570 |