Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2

Type:
Journal
Info:
Chem. Mater. 0, 0, null
Date:
2021-04-15

Author Information

Name Institution
Karsten ArtsEindhoven University of Technology
Harvey ThepassEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Riikka L. PuurunenAalto University
Erwin (W.M.M.) KesselsEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology

Films


Plasma Al2O3


Plasma SiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Reflectometry

Characteristic: Wet Etch Resistance
Analysis: Custom

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Substrates

Silicon

Keywords

Notes

1570