2021 Year in Review
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203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
90 Theses
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Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
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Experimental demonstration of single electron transistors featuring SiO2 plasma-enhanced atomic layer deposition in Ni-SiO2-Ni tunnel junctions
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 34, 01A122 (2016)
Date:
2015-11-05
Author Information
| Name | Institution |
|---|---|
| Golnaz Karbasian | University of Notre Dame |
| Michael S. McConnell | University of Notre Dame |
| Alexei P. Orlov | University of Notre Dame |
| Sergei Rouvimov | University of Notre Dame |
| Gregory L. Snider | University of Notre Dame |
Films
Plasma SiO2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: TEM, Transmission Electron Microscope
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Substrates
| Ni |
Keywords
Notes
| 412 |