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Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
Type:
Journal
Info:
ACS Nano, 11, 2017, (9), pp 9303-9311
Date:
2017-08-29
Author Information
| Name | Institution |
|---|---|
| Alfredo Mameli | Eindhoven University of Technology |
| Marc J. M. Merkx | Eindhoven University of Technology |
| Bora Karasulu | Eindhoven University of Technology |
| Fred Roozeboom | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Adriaan J. M. Mackus | Eindhoven University of Technology |
Films
Other SiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Substrates
| GeO2 |
| Si3N4 |
| SiO2 |
| WO3 |
| Al2O3 |
| TiO2 |
| HfO2 |
| CoOx |
| MoOx |
| FeOx |
| ZnO |
| Pt |
| Pd |
| Ru |
Notes
| 1056 |