Publication Information

Title:
Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
Type:
Journal
Info:
ACS Nano, 11, 2017, (9), pp 9303-9311
Date:
2017-08-29

Author Information

Name Institution
Alfredo MameliEindhoven University of Technology
Marc J. M. MerkxEindhoven University of Technology
Bora KarasuluEindhoven University of Technology
Fred RoozeboomEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology

Films

Other SiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

GeO2
Si3N4
SiO2
WO3
Al2O3
TiO2
HfO2
CoOx
MoOx
FeOx
ZnO
Pt
Pd
Ru

Keywords

Nucleation
Area Selective

Notes

1056