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Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
Type:
Journal
Info:
J. Phys. Chem. C, 2021, 125 (45), pp 24945-24957
Date:
2021-10-26
Author Information
| Name | Institution |
|---|---|
| M. A. Mione | Eindhoven University of Technology |
| Vincent Vandalon | Eindhoven University of Technology |
| Alfredo Mameli | TNO |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Fred Roozeboom | Eindhoven University of Technology |
Films
Plasma SiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Gas Phase Species
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Density
Analysis: Custom
Substrates
| Silicon |
Notes
| 1633 |