Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy

Type:
Journal
Info:
J. Phys. Chem. C, 2021, 125 (45), pp 24945-24957
Date:
2021-10-26

Author Information

Name Institution
M. A. MioneEindhoven University of Technology
Vincent VandalonEindhoven University of Technology
Alfredo MameliTNO
Erwin (W.M.M.) KesselsEindhoven University of Technology
Fred RoozeboomEindhoven University of Technology

Films

Plasma SiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Gas Phase Species
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Density
Analysis: Custom

Substrates

Silicon

Keywords

Reaction Mechanism

Notes

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