Publication Information

Title:
Energy-enhanced atomic layer deposition for more process and precursor versatility
Type:
Journal
Info:
Coordination Chemistry Reviews, Volume 257, Issues 23-24, 2013, Pages 3254 - 3270
Date:
2013-06-17

Author Information

Name Institution
Stephen E. PottsEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Al2O3


Plasma SiO2


Plasma TiO2


Film/Plasma Properties

Substrates

Keywords

Notes

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