Publication Information

Title: Energy-enhanced atomic layer deposition for more process and precursor versatility

Type: Journal

Info: Coordination Chemistry Reviews, Volume 257, Issues 23-24, 2013, Pages 3254 - 3270

Date: 2013-06-17

DOI: http://dx.doi.org/10.1016/j.ccr.2013.06.015

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature Range N/A

75-24-1

7782-44-7

Deposition Temperature Range N/A

27804-64-4

7782-44-7

Deposition Temperature Range N/A

546-68-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

609



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