Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process
Type:
Journal
Info:
J. Mater. Chem. C, 2014,2, 5805-5811
Date:
2014-05-12
Author Information
Name | Institution |
---|---|
Woo-Hee Kim | Yonsei University |
Films
Film/Plasma Properties
Characteristic: Extinction Coefficient
Analysis: -
Characteristic: Flat Band Voltage
Analysis: -
Characteristic: Leakage Current
Analysis: -
Characteristic: Compositional Depth Profiling
Analysis: SIMS, Secondary Ion Mass Spectrometry
Substrates
Notes
241 |