Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process

Type:
Journal
Info:
J. Mater. Chem. C, 2014,2, 5805-5811
Date:
2014-05-12

Author Information

Name Institution
Woo-Hee KimYonsei University

Films

Thermal B2O3


Plasma B2O3


Thermal SiO2


Plasma SiO2




Film/Plasma Properties

Characteristic: Extinction Coefficient
Analysis: -

Characteristic: Flat Band Voltage
Analysis: -

Characteristic: Leakage Current
Analysis: -

Characteristic: Compositional Depth Profiling
Analysis: SIMS, Secondary Ion Mass Spectrometry

Substrates

Notes

241