Publication Information

Title:
Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
Type:
Journal
Info:
Plasma Process Polym. 2019;e1900032
Date:
2019-03-29

Author Information

Name Institution
NoƩmi LeickColorado School of Mines
Jochem M.M. HuijsEindhoven University of Technology
Rafaiel A. OvanesyanColorado School of Mines
Dennis M. HausmannLam Research Corporation
Sumit AgarwalColorado School of Mines

Films

Plasma SiNx


Plasma SiNx


Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: ATR-FTIR

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: ATR-FTIR

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: HFS, Hydrogen Forward Scattering

Characteristic: Compositional Depth Profiling
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Substrates

Keywords

Reaction Mechanism

Notes

1355