Dennis M. Hausmann Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Dennis M. Hausmann returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma
2Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
3Surface reactions of aminosilane precursors during N2 plasma-assisted atomic layer deposition of SiNx
4Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
5Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
6Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics