Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 060904 (2019)
Date:
2019-08-22
Author Information
| Name | Institution |
|---|---|
| Rafaiel A. Ovanesyan | Colorado School of Mines |
| Ekaterina A. Filatova | Tyndall National Institute, University College Cork |
| Simon D. Elliott | Schrödinger |
| Dennis M. Hausmann | Lam Research Corporation |
| David C. Smith | Lam Research Corporation |
| Sumit Agarwal | Colorado School of Mines |
Films
Film/Plasma Properties
Substrates
Notes
| Review paper |
| 1645 |