Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 060904 (2019)
Date:
2019-08-22

Author Information

Name Institution
Rafaiel A. OvanesyanColorado School of Mines
Ekaterina A. FilatovaTyndall National Institute, University College Cork
Simon D. ElliottSchrödinger
Dennis M. HausmannLam Research Corporation
David C. SmithLam Research Corporation
Sumit AgarwalColorado School of Mines

Films

Plasma SiO2

Hardware used: Unknown


Plasma SiNx

Hardware used: Unknown


Plasma SiC

Hardware used: Unknown


Film/Plasma Properties

Substrates

Notes

Review paper
1645