Publication Information

Title: Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

Type: Journal

Info: ACS Appl. Mater. Interfaces, 0, 0 (0), pp null

Date: 2018-03-19

DOI: http://dx.doi.org/10.1021/acsami.8b00183

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Friedrich-Schiller-Universit├Ąt Jena

Friedrich-Schiller-Universit├Ąt Jena

Lam Research Corporation

Lam Research Corporation

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature Range = 150-300C

3275-24-9

7782-44-7

Deposition Temperature = 200C

3275-24-9

1333-74-0

7440-37-1

Deposition Temperature = 150C

0-0-0

7782-44-7

Deposition Temperature = 450C

0-0-0

1333-74-0

Deposition Temperature = 200C

27804-64-4

7782-44-7

Deposition Temperature = 500C

0-0-0

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000D

Uniformity

Ellipsometry

J.A. Woollam M-2000D

Refractive Index

Ellipsometry

J.A. Woollam M-2000D

Resistivity, Sheet Resistance

Four-point Probe

Signatone

Density

XRR, X-Ray Reflectivity

Bruker D8 Advance

Stress

Wafer Curvature

KLA-Tencor FLX 2320

Morphology, Roughness, Topography

XRR, X-Ray Reflectivity

Bruker D8 Advance

Wet Etch Resistance

Custom

Custom

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco Dimension 3100

Conformality, Step Coverage

TEM, Transmission Electron Microscope

JEOL 2010F

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

HAADF, High-Angle Annular Dark Field

JEOL JEM ARM 200

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Electron Diffraction

JEOL JEM ARM 200

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Substrates

Si(100)

SiO2

Keywords

Substrate Biasing

Plasma-Enhanced Atomic Layer Deposition

Notes

1106



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