Search Plasma ALD Publication Database By...

TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 78 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
2ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
3Annealing behavior of ferroelectric Si-doped HfO2 thin films
4Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
5Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
6Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
7Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
8Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
9Atomic layer deposition of titanium nitride from TDMAT precursor
10Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
11Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
12Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
13Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
14Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
15Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
16Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
17Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
18Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
19Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
20DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
21Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
22Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
23Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
24Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
25Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
26Fabrication and deformation of three-dimensional hollow ceramic nanostructures
27Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
28Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
29Fully CMOS-compatible titanium nitride nanoantennas
30High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
31Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
32Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
33Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
34Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
35Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
36Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
37Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
38Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
39Mechanical characterization of hollow ceramic nanolattices
40Microwave properties of superconducting atomic-layer deposited TiN films
41New materials for memristive switching
42NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
43Nitride memristors
44Non-destructive acoustic metrology and void detection in 3x50μm TSV
45Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
46Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
47Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
48Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
49Plasma Enhanced Atomic Layer Deposition on Powders
50Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
51Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
52Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
53Plasma-enhanced atomic layer deposition for plasmonic TiN
54Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
55Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
56Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
57Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
58Radical Enhanced Atomic Layer Deposition of Metals and Oxides
59Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
60Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
61Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
62Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
63Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
64Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
65Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
66Silicon nanowire networks for multi-stage thermoelectric modules
67Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
68Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
69Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
70Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
71Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
72Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
73Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
74TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
75TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
76Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
77Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
78Understanding and optimizing the floating body retention in FDSOI UTBOX

Follow @PlasmaALDGuy
Mark Sowa

Shortcuts



© 2014-2018 plasma-ald.com