TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 103 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance
2ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
3ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
4Annealing behavior of ferroelectric Si-doped HfO2 thin films
5Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
6Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
7Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
8Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
9Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
10Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
11Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
12Atomic layer deposition of titanium nitride for quantum circuits
13Atomic layer deposition of titanium nitride from TDMAT precursor
14Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
15Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
16Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
17Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
18Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
19Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
20Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
21Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
22Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
23Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
24DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
25Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
26Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
27Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
28Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
29Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
30Fabrication and deformation of three-dimensional hollow ceramic nanostructures
31Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
32Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
33Film Uniformity in Atomic Layer Deposition
34Fully CMOS BEOL compatible HfO2 RRAM cell, with low (μA) program current, strong retention and high scalability, using an optimized plasma enhanced atomic layer deposition (PEALD) process for TiN electrode
35Fully CMOS-compatible titanium nitride nanoantennas
36Fundamental beam studies of radical enhanced atomic layer deposition of TiN
37Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
38High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
39Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
40Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
41Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
42In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
43In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
44In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
45Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
46Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
47Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
48Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
49Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
50Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
51Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
52Mechanical characterization of hollow ceramic nanolattices
53Microwave properties of superconducting atomic-layer deposited TiN films
54New materials for memristive switching
55NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
56Nitride memristors
57Non-destructive acoustic metrology and void detection in 3x50μm TSV
58Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
59Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
60Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
61Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
62Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
63Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
64Plasma Enhanced Atomic Layer Deposition on Powders
65Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
66Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
67Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
68Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
69Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
70Plasma-enhanced atomic layer deposition for plasmonic TiN
71Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
72Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
73Plasma-enhanced atomic layer deposition of titanium vanadium nitride
74Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
75Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
76Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
77Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
78Radical Enhanced Atomic Layer Deposition of Metals and Oxides
79Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
80Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
81Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
82Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
83Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
84Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
85Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
86Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
87Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
88Silicon nanowire networks for multi-stage thermoelectric modules
89Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
90Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
91Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
92Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
93Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
94Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
95Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
96Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
97Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
98TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
99TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
100Tribological properties of thin films made by atomic layer deposition sliding against silicon
101Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
102Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
103Understanding and optimizing the floating body retention in FDSOI UTBOX


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