TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 100 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance
2	ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
3	ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
4	Annealing behavior of ferroelectric Si-doped HfO2 thin films
5	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
6	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
7	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
8	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
9	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
10	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
11	Atomic layer deposition of titanium nitride for quantum circuits
12	Atomic layer deposition of titanium nitride from TDMAT precursor
13	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
14	Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
15	Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
16	Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
17	Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
18	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
19	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
20	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
21	Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
22	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
23	DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
24	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
25	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
26	Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
27	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
28	Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
29	Fabrication and deformation of three-dimensional hollow ceramic nanostructures
30	Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
31	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
32	Film Uniformity in Atomic Layer Deposition
33	Fully CMOS-compatible titanium nitride nanoantennas
34	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
35	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
36	High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
37	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
38	Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
39	Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
40	In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
41	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
42	In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
43	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
44	Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
45	Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
46	Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
47	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
48	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
49	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
50	Mechanical characterization of hollow ceramic nanolattices
51	Microwave properties of superconducting atomic-layer deposited TiN films
52	New materials for memristive switching
53	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
54	Nitride memristors
55	Non-destructive acoustic metrology and void detection in 3x50μm TSV
56	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
57	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
58	Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
59	Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
60	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
61	Plasma Enhanced Atomic Layer Deposition on Powders
62	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
63	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
64	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
65	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
66	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
67	Plasma-enhanced atomic layer deposition for plasmonic TiN
68	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
69	Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
70	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
71	Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
72	Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
73	Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
74	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
75	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
76	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
77	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
78	Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
79	Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
80	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
81	Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
82	Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
83	Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
84	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
85	Silicon nanowire networks for multi-stage thermoelectric modules
86	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
87	Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
88	Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
89	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
90	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
91	Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
92	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
93	Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
94	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
95	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
96	TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
97	Tribological properties of thin films made by atomic layer deposition sliding against silicon
98	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
99	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
100	Understanding and optimizing the floating body retention in FDSOI UTBOX

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