TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 107 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A high-density carbon fiber neural recording array technology
2	A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance
3	ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
4	ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
5	ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
6	Annealing behavior of ferroelectric Si-doped HfO2 thin films
7	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
8	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
9	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
10	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
11	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
12	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
13	Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
14	Atomic layer deposition of titanium nitride for quantum circuits
15	Atomic layer deposition of titanium nitride from TDMAT precursor
16	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
17	Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
18	Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
19	Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
20	Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
21	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
22	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
23	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
24	Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
25	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
26	DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
27	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
28	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
29	Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
30	Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
31	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
32	Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
33	Fabrication and deformation of three-dimensional hollow ceramic nanostructures
34	Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
35	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
36	Film Uniformity in Atomic Layer Deposition
37	Fully CMOS BEOL compatible HfO2 RRAM cell, with low (μA) program current, strong retention and high scalability, using an optimized plasma enhanced atomic layer deposition (PEALD) process for TiN electrode
38	Fully CMOS-compatible titanium nitride nanoantennas
39	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
40	Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
41	High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
42	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
43	Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
44	Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
45	In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
46	In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
47	In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
48	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
49	Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
50	Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
51	Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
52	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
53	Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
54	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
55	Mechanical characterization of hollow ceramic nanolattices
56	Microwave properties of superconducting atomic-layer deposited TiN films
57	New materials for memristive switching
58	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
59	Nitride memristors
60	Non-destructive acoustic metrology and void detection in 3x50μm TSV
61	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
62	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
63	Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
64	Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
65	Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
66	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
67	Plasma Enhanced Atomic Layer Deposition on Powders
68	Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
69	Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
70	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
71	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
72	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
73	Plasma-enhanced atomic layer deposition for plasmonic TiN
74	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
75	Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
76	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
77	Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
78	Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
79	Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
80	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
81	Protective capping and surface passivation of III-V nanowires by atomic layer deposition
82	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
83	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
84	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
85	Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
86	Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
87	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
88	Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
89	Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
90	Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
91	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
92	Silicon nanowire networks for multi-stage thermoelectric modules
93	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
94	Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
95	Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
96	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
97	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
98	Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
99	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
100	Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
101	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
102	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
103	TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
104	Tribological properties of thin films made by atomic layer deposition sliding against silicon
105	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
106	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
107	Understanding and optimizing the floating body retention in FDSOI UTBOX

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