Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 127 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
2Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
3Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
4Mechanical characterization of hollow ceramic nanolattices
5Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
6Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
7Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
8Silicon nanowire networks for multi-stage thermoelectric modules
9Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
10Tribological properties of thin films made by atomic layer deposition sliding against silicon
11Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
12NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
13Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
14In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
15Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
16Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
17Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
18Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
19Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
20Fully CMOS BEOL compatible HfO2 RRAM cell, with low (μA) program current, strong retention and high scalability, using an optimized plasma enhanced atomic layer deposition (PEALD) process for TiN electrode
21Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
22Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
23Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
24Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
25Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
26Annealing behavior of ferroelectric Si-doped HfO2 thin films
27Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
28Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
29Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
30Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
31ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
32Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
33Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
34Plasma-enhanced atomic layer deposition for plasmonic TiN
35TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
36Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
37Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
38TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
39Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
40Understanding and optimizing the floating body retention in FDSOI UTBOX
41Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
42Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
43Atomic layer deposition of titanium nitride from TDMAT precursor
44Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
45Fully CMOS-compatible titanium nitride nanoantennas
46Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
47Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
48Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
49Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
50Nonvolatile Capacitive Crossbar Array for In-Memory Computing
51Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
52Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
53Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
54Radical Enhanced Atomic Layer Deposition of Metals and Oxides
55ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
56Nitride memristors
57Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
58Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
59ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
60In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
61Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
62Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
63High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
64Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
65Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
66Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
67Fundamental beam studies of radical enhanced atomic layer deposition of TiN
68Texture of atomic layer deposited ruthenium
69Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
70Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
71Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
72In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
73Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
74Plasma Enhanced Atomic Layer Deposition on Powders
75Film Uniformity in Atomic Layer Deposition
76Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
77Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
78Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
79Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
80Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
81Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
82Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
83Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
84Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
85Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
86Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
87Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
88Fabrication and deformation of three-dimensional hollow ceramic nanostructures
89Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
90Plasma-enhanced atomic layer deposition of titanium vanadium nitride
91Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
92Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
93Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
94Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
95Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
96A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance
97Non-destructive acoustic metrology and void detection in 3x50μm TSV
98Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
99Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
100Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
101Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
102Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
103Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
104Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
105Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
106Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
107Sub-10-nm ferroelectric Gd-doped HfO2 layers
108Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
109New materials for memristive switching
110Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
111Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
112Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
113Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
114Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
115The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
116DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
117Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
118Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
119Protective capping and surface passivation of III-V nanowires by atomic layer deposition
120Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
121Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
122Atomic layer deposition of titanium nitride for quantum circuits
123Microwave properties of superconducting atomic-layer deposited TiN films
124Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
125A high-density carbon fiber neural recording array technology
126Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
127Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique