TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 118 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1A high-density carbon fiber neural recording array technology
2A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance
3ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
4ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
5ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
6Annealing behavior of ferroelectric Si-doped HfO2 thin films
7Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
8Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
9Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
10Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
11Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
12Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
13Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
14Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
15Atomic layer deposition of titanium nitride for quantum circuits
16Atomic layer deposition of titanium nitride from TDMAT precursor
17Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
18Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
19Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
20Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
21Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
22Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
23Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
24Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
25Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
26Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
27Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
28DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
29Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
30Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
31Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
32Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
33Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
34Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
35Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
36Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
37Fabrication and deformation of three-dimensional hollow ceramic nanostructures
38Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
39Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
40Film Uniformity in Atomic Layer Deposition
41Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
42Fully CMOS BEOL compatible HfO2 RRAM cell, with low (μA) program current, strong retention and high scalability, using an optimized plasma enhanced atomic layer deposition (PEALD) process for TiN electrode
43Fully CMOS-compatible titanium nitride nanoantennas
44Fundamental beam studies of radical enhanced atomic layer deposition of TiN
45Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
46High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
47Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
48Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
49Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
50In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
51In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
52In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
53Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
54Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
55Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
56Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
57Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
58Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
59Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
60Mechanical characterization of hollow ceramic nanolattices
61Microwave properties of superconducting atomic-layer deposited TiN films
62New materials for memristive switching
63NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
64Nitride memristors
65Non-destructive acoustic metrology and void detection in 3x50μm TSV
66Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
67Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
68Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
69Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
70Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
71Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
72Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
73Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
74Plasma Enhanced Atomic Layer Deposition on Powders
75Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
76Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
77Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
78Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
79Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
80Plasma-enhanced atomic layer deposition for plasmonic TiN
81Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
82Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
83Plasma-enhanced atomic layer deposition of titanium vanadium nitride
84Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
85Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
86Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
87Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
88Protective capping and surface passivation of III-V nanowires by atomic layer deposition
89Radical Enhanced Atomic Layer Deposition of Metals and Oxides
90Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
91Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
92Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
93Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
94Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
95Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
96Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
97Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
98Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
99Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
100Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
101Silicon nanowire networks for multi-stage thermoelectric modules
102Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
103Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
104Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
105Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
106Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
107Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
108Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
109Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
110Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
111TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
112TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
113Tribological properties of thin films made by atomic layer deposition sliding against silicon
114Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
115Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
116Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
117Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
118Understanding and optimizing the floating body retention in FDSOI UTBOX