TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 127 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
2Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
3Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
4Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
5Radical Enhanced Atomic Layer Deposition of Metals and Oxides
6Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
7Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
8Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
9Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
10Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2
11Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
12Plasma Enhanced Atomic Layer Deposition on Powders
13Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
14Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
15Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
16Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
17Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
18Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
19Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
20Plasma-enhanced atomic layer deposition for plasmonic TiN
21Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
22Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
23Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
24Mechanical characterization of hollow ceramic nanolattices
25Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions
26Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
27Back-End, CMOS-Compatible Ferroelectric Field-Effect Transistor for Synaptic Weights
28Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
29Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
30TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
31ALD TiN Schottky Gates for Improved Electrical and Thermal Stability in III-N Devices
32Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
33Nitride memristors
34Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
35Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
36Understanding and optimizing the floating body retention in FDSOI UTBOX
37Atomic layer deposition of titanium nitride for quantum circuits
38ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
39Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
40Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
41Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
42Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
43Film Uniformity in Atomic Layer Deposition
44Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
45Plasma-enhanced atomic layer deposition of titanium vanadium nitride
46A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance
47Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
48Texture of atomic layer deposited ruthenium
49Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
50Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
51Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
52Atomic layer deposition of titanium nitride from TDMAT precursor
53Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
54Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
55Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
56Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
57Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
58Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
59Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
60Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
61Sub-10-nm ferroelectric Gd-doped HfO2 layers
62Fundamental beam studies of radical enhanced atomic layer deposition of TiN
63Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
64Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
65In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
66In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
67Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
68Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
69Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
70Fully CMOS BEOL compatible HfO2 RRAM cell, with low (μA) program current, strong retention and high scalability, using an optimized plasma enhanced atomic layer deposition (PEALD) process for TiN electrode
71Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
72Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
73Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
74Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
75Silicon nanowire networks for multi-stage thermoelectric modules
76A high-density carbon fiber neural recording array technology
77Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
78In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
79Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
80Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
81The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
82Fully CMOS-compatible titanium nitride nanoantennas
83Protective capping and surface passivation of III-V nanowires by atomic layer deposition
84Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
85Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
86Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
87Non-destructive acoustic metrology and void detection in 3x50μm TSV
88DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
89Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
90Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
91Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
92Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
93Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
94Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
95Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
96Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
97High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
98Thermal stability of antiferroelectric-like Al:HfO2 thin films with TiN or Pt electrodes
99Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3
100Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
101Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
102NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
103Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
104Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
105Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
106Microwave properties of superconducting atomic-layer deposited TiN films
107Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
108Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
109TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
110Tribological properties of thin films made by atomic layer deposition sliding against silicon
111Annealing behavior of ferroelectric Si-doped HfO2 thin films
112Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
113Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
114New materials for memristive switching
115Nonvolatile Capacitive Crossbar Array for In-Memory Computing
116Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
117Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
118Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
119Fabrication and deformation of three-dimensional hollow ceramic nanostructures
120Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
121Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
122Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
123Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
124Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
125Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
126Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
127Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN