TiN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing TiN films returned 92 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	A scaled replacement metal gate InGaAs-on-Insulator n-FinFET on Si with record performance
2	ALD titanium nitride coated carbon nanotube electrodes for electrochemical supercapacitors
3	ALD titanium nitride on vertically aligned carbon nanotube forests for electrochemical supercapacitors
4	Annealing behavior of ferroelectric Si-doped HfO2 thin films
5	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
6	Approximation of PE-MOCVD to ALD for TiN Concerning Resistivity and Chemical Composition
7	Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
8	Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
9	Atomic Layer Deposition of Ruthenium with TiN Interface for Sub-10 nm Advanced Interconnects beyond Copper
10	Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
11	Atomic layer deposition of titanium nitride for quantum circuits
12	Atomic layer deposition of titanium nitride from TDMAT precursor
13	Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
14	Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes
15	Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method
16	Comparison of gate dielectric plasma damage from plasma-enhanced atomic layer deposited and magnetron sputtered TiN metal gates
17	Comparison of the Low-Frequency Noise of Bulk Triple-Gate FinFETs With and Without Dynamic Threshold Operation
18	Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
19	Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing
20	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
21	Damage free Ar ion plasma surface treatment on In0.53Ga0.47As-on-silicon metal-oxide-semiconductor device
22	Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
23	DIBL in enhanced dynamic threshold operation of UTBB SOI with different drain engineering at high temperatures
24	Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique
25	Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
26	Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
27	Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
28	Extensionless UTBB FDSOI Devices in Enhanced Dynamic Threshold Mode under Low Power Point of View
29	Fabrication and deformation of three-dimensional hollow ceramic nanostructures
30	Fabrication of Highly Ordered and Well-Aligned PbTiO3/TiN Core-Shell Nanotube Arrays
31	Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
32	Fully CMOS-compatible titanium nitride nanoantennas
33	Fundamental beam studies of radical enhanced atomic layer deposition of TiN
34	High aspect ratio iridescent three-dimensional metal-insulator-metal capacitors using atomic layer deposition
35	Highly-Conformal TiN Thin Films Grown by Thermal and Plasma-Enhanced Atomic Layer Deposition
36	Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
37	Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
38	In0.53Ga0.47As FinFET and GAA-FET With Remote-Plasma Treatment
39	Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
40	Investigation of Bulk and DTMOS triple-gate devices under 60 MeV proton irradiation
41	Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
42	Low-temperature (≤200°C) plasma enhanced atomic layer deposition of dense titanium nitride thin films
43	Low-Temperature Low-Resistivity PEALD TiN Using TDMAT under Hydrogen Reducing Ambient
44	Mechanical characterization of hollow ceramic nanolattices
45	Microwave properties of superconducting atomic-layer deposited TiN films
46	New materials for memristive switching
47	NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
48	Nitride memristors
49	Non-destructive acoustic metrology and void detection in 3x50μm TSV
50	Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
51	Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
52	Partitioning Electrostatic and Mechanical Domains in Nanoelectromechanical Relays
53	Photoelectrochemical hydrogen production on silicon microwire arrays overlaid with ultrathin titanium nitride
54	Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
55	Plasma Enhanced Atomic Layer Deposition on Powders
56	Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
57	Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
58	Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)
59	Plasma-enhanced atomic layer deposition for plasmonic TiN
60	Plasma-Enhanced Atomic Layer Deposition of Ru-TiN Thin Films for Copper Diffusion Barrier Metals
61	Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material
62	Plasma-enhanced atomic layer deposition of titanium vanadium nitride
63	Potassium Permanganate-Based Slurry to Reduce the Galvanic Corrosion of the Cu/Ru/TiN Barrier Liner Stack during CMP in the BEOL Interconnects
64	Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
65	Preparation of TiN films by plasma assisted atomic layer deposition for copper metallization
66	Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
67	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
68	Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
69	Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
70	Remote Plasma-Enhanced Atomic-Layer Deposition of TiN by Using TDMAT with a NH3 Plasma
71	Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
72	Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition
73	Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
74	Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices
75	Silicon film thickness influence on enhanced dynamic threshold UTBB SOI nMOSFETs
76	Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
77	Silicon nanowire networks for multi-stage thermoelectric modules
78	Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
79	Stuffing-enabled surface confinement of silanes used as sealing agents on CF4 plasma-exposed 2.0 p-OSG films
80	Sub-0.5 nm Equivalent Oxide Thickness Scaling for Si-Doped Zr1-xHfxO2 Thin Film without Using Noble Metal Electrode
81	Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
82	Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
83	Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
84	Thermal Versus Plasma-Enhanced ALD: Growth Kinetics and Conformality
85	Three-Dimensional Solid-State Lithium-Ion Batteries Fabricated by Conformal Vapor-Phase Chemistry
86	Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
87	TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
88	TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
89	Tribological properties of thin films made by atomic layer deposition sliding against silicon
90	Tunable Work-Function Engineering of TiC-TiN Compound by Atomic Layer Deposition for Metal Gate Applications
91	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
92	Understanding and optimizing the floating body retention in FDSOI UTBOX

Shortcuts

© 2014-2019 plasma-ald.com