Publication Information

Title:
Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
Type:
Journal
Info:
J. Vac. Sci. Technol. A 36(6), Nov/Dec 2018
Date:
2018-10-18

Author Information

Name Institution
Igor KrylovTechnion-Israel Institute of Technology
Xianbin XuTechnion-Israel Institute of Technology
Ekaterina ZoubenkoTechnion-Israel Institute of Technology
Kamira WeinfeldTechnion-Israel Institute of Technology
Santiago BoyerasNational Scientific and Technical Research Council (CONICET)/National Technology University (UTN-FRBA)
Felix PalumboNational Scientific and Technical Research Council (CONICET)/National Technology University (UTN-FRBA)
Moshe EizenbergTechnion-Israel Institute of Technology
Dan RitterTechnion-Israel Institute of Technology

Films





Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

SiO2

Keywords

Notes

1197