Igor Krylov Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Igor Krylov returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
2Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications
3Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition
4A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors
5Obtaining low resistivity (~100 µΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
6A comparative study of AlN and Al2O3 based gate stacks grown by atomic layer deposition on InGaAs
7Electrical and structural properties of conductive nitride films grown by plasma enhanced atomic layer deposition with significant ion bombardment effect
8Properties of conductive nitride films prepared by plasma enhanced atomic layer deposition using quartz and sapphire plasma sources
9Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition