Effect of the substrate on structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 060905 (2019)
Date:
2019-09-04

Author Information

Name Institution
Igor KrylovTower Semiconductor Ltd.
Xianbin XuTechnion-Israel Institute of Technology
Yuanshen QiTechnion-Israel Institute of Technology
Kamira WeinfeldTechnion-Israel Institute of Technology
Valentina KorchnoyTechnion-Israel Institute of Technology
Moshe EizenbergTechnion-Israel Institute of Technology
Dan RitterTechnion-Israel Institute of Technology

Films




Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Substrates

Al2O3
HfO2
WO3
MoOx
SiO2
TiO2
Ta2O5
Sapphire
MgO
SrTiO3

Keywords

Notes

1593