A comparison between HfO2/Al2O3 nano-laminates and ternary HfxAlyO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors

Publication Information

Title: A comparison between HfO₂/Al₂O₃ nano-laminates and ternary Hf_xAl_yO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors

Type: Journal

Info: Journal of Applied Physics 120, 124505 (2016)

Date: 2016-09-02

DOI: http://dx.doi.org/10.1063/1.4962855

Author Information

Name

Institution

Igor Krylov

Technion-Israel Institute of Technology

Boaz Pokroy

Technion-Israel Institute of Technology

Moshe Eizenberg

Technion-Israel Institute of Technology

Dan Ritter

Technion-Israel Institute of Technology

Films

Thermal Al₂O₃ using Veeco - Ultratech - Cambridge NanoTech Savannah

Deposition Temperature = 270C

TMA, AlMe₃, Trimethyl Aluminum

75-24-1

Where to buy precursor

H₂O, Water

7732-18-5

Thermal HfO₂ using Veeco - Ultratech - Cambridge NanoTech Savannah

Deposition Temperature = 270C

TDMAHf, (Me₂N)₄Hf, [(CH₃)₂N]₄Hf, Tetrakis(DiMethylAmido) Hafnium, Hafnium Dimethylamide, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

H₂O, Water

7732-18-5

Thermal HfAlO_x using Veeco - Ultratech - Cambridge NanoTech Savannah

Deposition Temperature = 270C

TMA, AlMe₃, Trimethyl Aluminum

75-24-1

Where to buy precursor

TDMAHf, (Me₂N)₄Hf, [(CH₃)₂N]₄Hf, Tetrakis(DiMethylAmido) Hafnium, Hafnium Dimethylamide, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

H₂O, Water

7732-18-5

Thermal Al₂O₃ using Picosun SUNALE R-150B

Deposition Temperature = 270C

TMA, AlMe₃, Trimethyl Aluminum

75-24-1

Where to buy precursor

H₂O, Water

7732-18-5

Thermal Al₂O₃ using Picosun SUNALE R-150B

Deposition Temperature = 270C

TMA, AlMe₃, Trimethyl Aluminum

75-24-1

Where to buy precursor

O₃, Ozone

10028-15-6

Plasma Al₂O₃ using Picosun SUNALE R-150B

Deposition Temperature = 270C

TMA, AlMe₃, Trimethyl Aluminum

75-24-1

Where to buy precursor

O₂, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo VG Sigma Probe

Images

TEM, Transmission Electron Microscope

FEI Titan

Chemical Composition, Impurities

HAADF, High-Angle Annular Dark Field

Compositional Depth Profiling

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Flat Band Voltage

C-V, Capacitance-Voltage Measurements