Name

Institution

Igor Krylov

Technion-Israel Institute of Technology

Boaz Pokroy

Technion-Israel Institute of Technology

Moshe Eizenberg

Technion-Israel Institute of Technology

Dan Ritter

Technion-Israel Institute of Technology

Thermal Al₂O₃ using Cambridge NanoTech Savannah

Deposition Temperature = 270C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Water, H₂O

7732-18-5

Thermal HfO₂ using Cambridge NanoTech Savannah

Deposition Temperature = 270C

TDMAH, TDMAHf, Tetrakis[DiMethylAmido]Hafnium, Tetrakis[DiMethylAmino]Hafnium, Hafnium Dimethylamide, [Me₂N]₄Hf, [(CH₃)₂N]₄Hf, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

Water, H₂O

7732-18-5

Thermal HfAlO_x using Cambridge NanoTech Savannah

Deposition Temperature = 270C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

TDMAH, TDMAHf, Tetrakis[DiMethylAmido]Hafnium, Tetrakis[DiMethylAmino]Hafnium, Hafnium Dimethylamide, [Me₂N]₄Hf, [(CH₃)₂N]₄Hf, also CAS# 19782-68-4

19962-11-9

Where to buy precursor

Water, H₂O

7732-18-5

Thermal Al₂O₃ using Picosun SUNALE R-150B

Deposition Temperature = 270C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Water, H₂O

7732-18-5

Thermal Al₂O₃ using Picosun SUNALE R-150B

Deposition Temperature = 270C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Ozone, O₃

10028-15-6

Plasma Al₂O₃ using Picosun SUNALE R-150B

Deposition Temperature = 270C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Oxygen, O₂

7782-44-7

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo VG Sigma Probe

Images

TEM, Transmission Electron Microscope

FEI Titan

Chemical Composition, Impurities

HAADF, High-Angle Annular Dark Field

Unknown

Compositional Depth Profiling

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Flat Band Voltage

C-V, Capacitance-Voltage Measurements

Agilent E4980A Precision LCR Meter

Interface Trap Density

C-V, Capacitance-Voltage Measurements

Agilent E4980A Precision LCR Meter

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Agilent E4980A Precision LCR Meter

Hysteresis

C-V, Capacitance-Voltage Measurements

Agilent E4980A Precision LCR Meter

Dispersion

C-V, Capacitance-Voltage Measurements

Agilent E4980A Precision LCR Meter

Leakage Current

I-V, Current-Voltage Measurements

HP 4140

InGaAs

Plasma vs Thermal Comparison

791