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Atomic layer epitaxy of germanium Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnO_x infrared transparent conductive thin films Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells

A comparison between HfO₂/Al₂O₃ nano-laminates and ternary Hf_xAl_yO compound as the dielectric material in InGaAs based metal-oxide-semiconductor (MOS) capacitors

Type:

Journal

Info:

Journal of Applied Physics 120, 124505 (2016)

Date:

2016-09-02

DOI:

http://dx.doi.org/10.1063/1.4962855

Author Information

Name	Institution
Igor Krylov	Technion-Israel Institute of Technology
Boaz Pokroy	Technion-Israel Institute of Technology
Moshe Eizenberg	Technion-Israel Institute of Technology
Dan Ritter	Technion-Israel Institute of Technology

Films

Thermal Al₂O₃

Hardware used: Veeco - Ultratech - Cambridge NanoTech Savannah

TMA, trimethyl aluminum, AlMe₃

CAS#: 75-24-1

Where to buy precursor

H₂O, Water

CAS#: 7732-18-5

Deposition Temperature = 270C

Thermal HfO₂

Hardware used: Veeco - Ultratech - Cambridge NanoTech Savannah

TDMAHf, tetrakis(dimethylamido)hafnium, hafnium dimethylamide, (Me₂N)₄Hf, also CAS# 19782-68-4

CAS#: 19962-11-9

Where to buy precursor

H₂O, Water

CAS#: 7732-18-5

Deposition Temperature = 270C

Thermal HfAlO_x

Hardware used: Veeco - Ultratech - Cambridge NanoTech Savannah

TMA, trimethyl aluminum, AlMe₃

CAS#: 75-24-1

Where to buy precursor

TDMAHf, tetrakis(dimethylamido)hafnium, hafnium dimethylamide, (Me₂N)₄Hf, also CAS# 19782-68-4

CAS#: 19962-11-9

Where to buy precursor

H₂O, Water

CAS#: 7732-18-5

Deposition Temperature = 270C

Thermal Al₂O₃

Hardware used: Picosun SUNALE R-150B

TMA, trimethyl aluminum, AlMe₃

CAS#: 75-24-1

Where to buy precursor

H₂O, Water

CAS#: 7732-18-5

Deposition Temperature = 270C

Thermal Al₂O₃

Hardware used: Picosun SUNALE R-150B

TMA, trimethyl aluminum, AlMe₃

CAS#: 75-24-1

Where to buy precursor

O₃, Ozone

CAS#: 10028-15-6

Deposition Temperature = 270C

Plasma Al₂O₃

Hardware used: Picosun SUNALE R-150B

TMA, trimethyl aluminum, AlMe₃

CAS#: 75-24-1

Where to buy precursor

O₂, Oxygen

CAS#: 7782-44-7

Deposition Temperature = 270C

Film/Plasma Properties

Characteristic: Thickness

Analysis: Ellipsometry

Diagnostic: -

Characteristic: Chemical Composition, Impurities

Analysis: XPS, X-ray Photoelectron Spectroscopy

Diagnostic: Thermo VG Sigma Probe

Characteristic: Images

Analysis: TEM, Transmission Electron Microscope

Diagnostic: FEI Titan

Characteristic: Chemical Composition, Impurities

Analysis: HAADF, High-Angle Annular Dark Field

Diagnostic: -

Characteristic: Compositional Depth Profiling

Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Diagnostic: -

Characteristic: Flat Band Voltage