Publication Information

Title:
Fundamental beam studies of radical enhanced atomic layer deposition of TiN
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 21, 96-105 (2003)
Date:
2002-09-30

Author Information

Name Institution
Frank GreerUniversity of California - Berkeley
D. FraserUniversity of California - Berkeley
J. W. CoburnUniversity of California - Berkeley
David B. GravesUniversity of California - Berkeley

Films

Plasma TiN


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Surface Reactions
Analysis: QCM, Quartz Crystal Microbalance

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Substrates

Silicon

Keywords

Reaction Mechanism

Notes

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